JPS56122034A - Photomask - Google Patents
PhotomaskInfo
- Publication number
- JPS56122034A JPS56122034A JP2542380A JP2542380A JPS56122034A JP S56122034 A JPS56122034 A JP S56122034A JP 2542380 A JP2542380 A JP 2542380A JP 2542380 A JP2542380 A JP 2542380A JP S56122034 A JPS56122034 A JP S56122034A
- Authority
- JP
- Japan
- Prior art keywords
- pattern
- semiconductor chip
- corner parts
- round
- photomask
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 239000004065 semiconductor Substances 0.000 abstract 2
- 230000015556 catabolic process Effects 0.000 abstract 1
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
- G03F1/38—Masks having auxiliary features, e.g. special coatings or marks for alignment or testing; Preparation thereof
- G03F1/40—Electrostatic discharge [ESD] related features, e.g. antistatic coatings or a conductive metal layer around the periphery of the mask substrate
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Preparing Plates And Mask In Photomechanical Process (AREA)
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2542380A JPS56122034A (en) | 1980-02-29 | 1980-02-29 | Photomask |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2542380A JPS56122034A (en) | 1980-02-29 | 1980-02-29 | Photomask |
Publications (2)
Publication Number | Publication Date |
---|---|
JPS56122034A true JPS56122034A (en) | 1981-09-25 |
JPS6148706B2 JPS6148706B2 (en]) | 1986-10-25 |
Family
ID=12165540
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2542380A Granted JPS56122034A (en) | 1980-02-29 | 1980-02-29 | Photomask |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS56122034A (en]) |
Cited By (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS60154959U (ja) * | 1984-03-23 | 1985-10-16 | ホ−ヤ株式会社 | フオトマスクパタ−ン |
JPH0239152A (ja) * | 1988-07-29 | 1990-02-08 | Sony Corp | 光露光用マスク |
JP2012169457A (ja) * | 2011-02-14 | 2012-09-06 | Ngk Spark Plug Co Ltd | 配線基板の製造方法 |
Families Citing this family (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS63124904U (en]) * | 1987-02-06 | 1988-08-15 |
-
1980
- 1980-02-29 JP JP2542380A patent/JPS56122034A/ja active Granted
Cited By (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS60154959U (ja) * | 1984-03-23 | 1985-10-16 | ホ−ヤ株式会社 | フオトマスクパタ−ン |
JPH0239152A (ja) * | 1988-07-29 | 1990-02-08 | Sony Corp | 光露光用マスク |
JP2012169457A (ja) * | 2011-02-14 | 2012-09-06 | Ngk Spark Plug Co Ltd | 配線基板の製造方法 |
Also Published As
Publication number | Publication date |
---|---|
JPS6148706B2 (en]) | 1986-10-25 |
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